Toggle Main Menu Toggle Search

Open Access padlockePrints

Stable hydrogen pair trapped at carbon impurities in silicon

Lookup NU author(s): Professor Patrick Briddon

Downloads

Full text for this publication is not currently held within this repository. Alternative links are provided below where available.


Abstract

Local mode spectroscopy and ab initio modeling are used to investigate two trigonal defects found in carbon rich Si into which H had been in-diffused. Isotopic shifts with D and C-13 are reported along with the effect of uniaxial stress. Ab-initio modeling studies suggest that the two defects are two forms of the CH2* complex where one of the two hydrogen atoms lies at an anti-bonding site attached to C or Si respectively. The two structures are nearly degenerate and possess vibrational modes in good agreement with those observed experimentally. The defects are energetically favorable in comparison with separated C-s and H-2 in Si and may represent aggregation sites for hydrogen.


Publication metadata

Author(s): Markevich VP, Hourahine B, Newman RC, Jones R, Kleverman M, Lindstrom JL, Murin LI, Suezawa M, Oberg S, Briddon PR

Editor(s): Fisher, D.J.

Publication type: Book Chapter

Publication status: Published

Book Title: Defects and Diffusion in Semiconductors: An Annual Retrospective VII

Year: 2003

Volume: 221-222

Pages: 1-9

Print publication date: 01/01/2003

Publisher: Trans Tech Publications Ltd.

Place Published: Zurich, Switzerland

URL: http://dx.doi.org/10.4028/www.scientific.net/DDF.221-223.1

DOI: 10.4028/www.scientific.net/DDF.221-223.1

Library holdings: Search Newcastle University Library for this item

ISBN: 9783908451044


Share