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Fabrication of test structures to monitor stress in SU-8 films used for MEMS applications

Lookup NU author(s): Nathan Brockie, Christopher Wilson, Dr Alton Horsfall

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Abstract

SU-8, an epoxy based negative photoresist, is widely used in the manufacture of micromechanical systems but can exhibit significant levels of stress build-up during processing. This paper describes micromechanical test structures that provide the opportunity to spatially characterise stress the in SU-8 at different stages of the process. The structures are fabricated in a thick layer of SU-8 and are subsequently released from the underlying substrate using a dry chemical vapour etch process. The initial results indicate that there is significant tensile stress in the SU-8, and that this demonstrates a radial variation along with a dependence on the process conditions. ©2010 IEEE.


Publication metadata

Author(s): Smith S, Brockie N, Murray J, Wilson C, Horsfall A, Terry J, Stevenson J, Mount A, Walton A

Publication type: Conference Proceedings (inc. Abstract)

Publication status: Published

Conference Name: IEEE International Conference on Microelectronic Test Structures

Year of Conference: 2010

Pages: 8-13

Publisher: IEEE

URL: http://dx.doi.org/10.1109/ICMTS.2010.5466870

DOI: 10.1109/ICMTS.2010.5466870

Library holdings: Search Newcastle University Library for this item

ISBN: 9781424469154


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