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Atomic layer deposition of Ti-HfO₂ dielectrics

Lookup NU author(s): Dr Peter King

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Author(s): Werner M, King PJ, Hindley S, Romani S, Mather S, Chalker PR, Williams PA, van den Berg JA

Publication type: Article

Publication status: Published

Journal: Journal of Vacuum Science & Technology A

Year: 2013

Volume: 31

Issue: 1

ISSN (print): 1071-8028

ISSN (electronic): 1944-2807

Publisher: American Institute of Physics

URL: http://dx.doi.org/10.1116/1.4748570

DOI: 10.1116/1.4748570

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