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Structural and electronic properties of GaN nanowires with embedded InxGa1-_xN nanodisks

Lookup NU author(s): Dr Mark Rayson, Professor Patrick Briddon

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Abstract

In the present study, the effects of various types of strain and indium concentration on the total energy and optoelectronic properties of GaN nanowires (NWs) with embedded InxGa1-xN nanodisks (NDs) are examined. In particular, the bi-axial, hydrostatic, and uniaxial strain states of the embedded InxGa1-xN NDs are investigated for multiple In concentrations. Density functional theory is employed to calculate the band structure of the NWs. The theoretical analysis finds that the supercell-size-dependent characteristics calculated for our 972-atom NW models are very close to the infinite supercell-size limit. It is established that the embedded InxGa1-xN NDs do not induce deep states in the band gap of the NWs. A bowing parameter of 1.82 eV is derived from our analysis in the quadratic Vegard's formula for the band gaps at the various In concentrations of the investigated InxGa1-xN NDs in GaN NW structures. It is concluded that up to similar to 10% of In, the hydrostatic strain state is competitive with the bi-axial due to the radial absorption of the strain on the surfaces. Above this value, the dominant strain state is the bi-axial one. Thus, hydrostatic and bi-axial strain components coexist in the embedded NDs, and they are of different physical origin. The bi-axial strain comes from growth on lattice mismatched substrates, while the hydrostatic strain originates from the lateral relaxation of the surfaces. (C) 2015 AIP Publishing LLC.

Publication metadata

Author(s): Kioseoglou J, Pavloudis T, Kehagias T, Komninou P, Karakostas T, Latham CD, Rayson MJ, Briddon PR, Eickhoff M

Publication type: Article

Publication status: Published

Journal: Journal of Applied Physics

Year: 2015

Volume: 118

Issue: 3

Print publication date: 21/07/2015

Online publication date: 15/07/2015

Acceptance date: 02/07/2015

ISSN (print): 0021-8979

ISSN (electronic): 1089-7550

Publisher: AIP Publishing LLC

URL: http://dx.doi.org/10.1063/1.4926757

DOI: 10.1063/1.4926757

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