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Temperature impact on switching characteristics of resistive memory devices with HfO_x/TiO_x/HfO_x stack dielectric

Lookup NU author(s): Dr Alton Horsfall, Professor Nick Wright

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Abstract

The forming free and reliable switching behavior is observed in the resistive memory devices with HfOx/TiOx/HfO in 298-373 K temperature range. The charge transport in LRS is governed by Ohmic conduction of electrons while HRS governed by F-P emission. The defect assisted filamentary conduction is possibly due to the formation of a high density of localized oxygen vacancies created by thin TiOx layer in the stack. No significant dispersion in set and reset voltage is observed at higher temperature. The memory device exhibits stable retention characteristics at higher temperature with less degradation of resistance ratio. (C) 2015 Elsevier B.V. All rights reserved.

Publication metadata

Author(s): Mahapatra R, Maji S, Horsfall AB, Wright NG

Publication type: Article

Publication status: Published

Journal: Microelectronic Engineering

Year: 2015

Volume: 138

Pages: 118-121

Print publication date: 20/04/2015

Online publication date: 16/03/2015

Acceptance date: 09/03/2015

ISSN (print): 0167-9317

ISSN (electronic): 1873-5568

Publisher: Elsevier

URL: http://dx.doi.org/10.1016/j.mee.2015.03.008

DOI: 10.1016/j.mee.2015.03.008

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