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Electroless Nickel Deposition: an Alternative for Graphene Contacting

Lookup NU author(s): Sinziana Popescu, Dr Anders Barlow, Sami Ramadan, Srinivas Ganti, Professor Biswjit Ghosh, Dr John Hedley

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This work is licensed under a Creative Commons Attribution-NonCommercial 4.0 International License (CC BY-NC 4.0).

Abstract

We report the first investigation into the potential of electroless nickel deposition to form ohmic contacts on single layer graphene. Aiming to minimize the contact resistance on graphene, a statistical model was used to improve metal purity, surface roughness and coverage of the deposited film by controlling the nickel bath parameters (pH and temperature). The metalized graphene layers were patterned using photolithography and contacts deposited at temperatures as low as 60°C. The contact resistance was 215 ± 23 Ω over a contact area of 200 μm x 200 μm, which improved upon rapid annealing to 107 ± 9 Ω. This method shows promise towards low-cost and large-scale graphene integration into functional devices such as flexible sensors and printed electronics.

Publication metadata

Author(s): Popescu S, Barlow A, Ramadan S, Ganti S, Ghosh B, Hedley J

Publication type: Article

Publication status: Published

Journal: ACS Applied Materials & Interfaces

Year: 2016

Volume: 8

Issue: 45

Pages: 31359–31367

Print publication date: 16/11/2016

Online publication date: 21/10/2016

Acceptance date: 20/10/2016

Date deposited: 24/10/2016

ISSN (print): 1944-8244

ISSN (electronic): 1944-8252

Publisher: American Chemical Society

URL: http://dx.doi.org/10.1021/acsami.6b08290

DOI: 10.1021/acsami.6b08290

Data Access Statement: http://dx.doi.org/10.17634/101566-1

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