Browse by author
Lookup NU author(s): Dr Chuan ChengORCiD
This work is licensed under a Creative Commons Attribution 4.0 International License (CC BY 4.0).
The intrinsic charge-induced surface stress of Ni thin films during electrochemical reactions with an alkaline electrolyte is measured in situ. Surface stresses induced by H absorption/desorption, α-Ni(OH)2 formation, capacitive double-layer charging, the α- to β-Ni(OH)2 transformation, and β-Ni(OH)2/β-NiOOH redox reactions are identified, and each provided additive contributions to the overall stress state. Surface stresses are magnified in high-surface-area nanoporous Ni because local stress-relaxation mechanisms are restricted when compared to a smooth Ni film. Ni film reversible tensile/compressive surface stresses correlate with anodic/cathodic potential scanning but with an opposite trend to that of a less reactive Au film. Surface stresses in the Ni films are up to 40 times that of Au films and suggest the possibility of using controlled surface-stress generation for electrochemical actuation.
Author(s): Cheng C, Grant PS, Lührs L
Publication type: Article
Publication status: Published
Journal: Advanced Electronic Materials
Year: 2020
Volume: 6
Print publication date: 01/01/2020
Online publication date: 18/11/2019
Acceptance date: 04/11/2019
Date deposited: 02/02/2023
ISSN (electronic): 2199-160X
Publisher: Wiley-VCH Verlag GmbH & Co. KGaA
URL: https://doi.org/10.1002/aelm.201900364
DOI: 10.1002/aelm.201900364
Altmetrics provided by Altmetric