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An apparatus for glancing incidence ion beam polishing and characterization of surfaces to angstrom-scale root-mean-square roughness

Lookup NU author(s): Professor Ken Snowdon

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Abstract

An instrument is described which combines a glancing incidence ion beam erosion system with a scanning tunneling and an atomic force microscope. This instrument allows the ion beam polishing and surface topographic characterization of conducting and insulating, crystalline, polycrystalline, and amorphous samples under ultrahigh vacuum conditions. As an illustration of the capability of the instrument and the polishing technique, we present results demonstrating a fivefold improvement in rms roughness of a polycrystalline Cr film and a fivefold reduction in rms roughness of a vicinal, initially mechanically polished CaF2 (111) sample. The final rms roughness of the latter sample of 0.12±0.04 nm measured over the bandwidth of 10-500 nm is just 75% of the Ca-F interlayer spacing for the (111) surface orientation. © 1996 American Institute of Physics.

Publication metadata

Author(s): Wissing M, Holzwarth M, Simeonova DS, Snowdon KJ

Publication type: Article

Publication status: Published

Journal: Review of Scientific Instruments

Year: 1996

Volume: 67

Issue: 12

Pages: 4314-4320

Print publication date: 01/12/1996

ISSN (print): 0034-6748

ISSN (electronic): 1089-7623

Publisher: American Institute of Physics

URL: http://dx.doi.org/10.1063/1.1147532

DOI: 10.1063/1.1147532

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