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Optimal preamorphization conditions for the formation of highly activated ultra shallow junctions in Silicon-On-Insulator

Lookup NU author(s): Professor Nick Cowern


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Publication metadata

Author(s): Hamilton JJ, Collart EJH, Bersani M, Giubertoni D, Gennaro S, Bennett NS, Cowern NEB, Kirkby KJ

Publication type: Conference Proceedings (inc. Abstract)

Publication status: Published

Conference Name: Ion Implantation Technology Conference

Year of Conference: 2006