Toggle Main Menu Toggle Search

Open Access padlockePrints

Application of CVD-W Diffusion Barrier Layers to Dual Damascene Copper Contacts

Lookup NU author(s): Dr Alton Horsfall, Professor Anthony O'Neill


Full text for this publication is not currently held within this repository. Alternative links are provided below where available.

Publication metadata

Author(s): Wang K, Cuthbertson A, Horsfall AB, Yeoh JC, Herberholz R, O'Neill AG, Colledge S, Coulson HP, Watson D, Braithwaite G

Publication type: Conference Proceedings (inc. Abstract)

Publication status: Unknown

Conference Name: VLSI Multilevel Interconnection Conference

Year of Conference: 2007