Browse by author
Lookup NU author(s): Professor Peter Cumpson, Dr John Wolstenholme
Full text for this publication is not currently held within this repository. Alternative links are provided below where available.
A summary of the workshop entitled 'Angle-Resolved XPS: The Current Status and Future Prospects for Angle-resolved XPS of Nano and Subnano Films' is given, which was held at the Riviera Maya, Mexico, 26-30March 2007, under the main sponsorship of the International Union for Vacuum Science, Technique and Applications (IUVSTA). Angle-resolved X-ray photoelectron spectroscopy (ARXPS) can provide detailed chemical as well as depth profile information about the near-surface composition of materials and thin films. This workshop was held to review the present status and level of understanding of Angle-resolved XPS, and to stimulate discussions leading to a deeper understanding of current problems and new solutions. The main goal of the workshop was to find better ways to perform experiments and, very importantly, better ways to extract information from the experimental data. This report contains summaries of presentations and discussions that were held in sessions entitled 'Basics and Present Limits of ARXPS', the Analysis of ARXPS Data, Applications of ARXPS, Equipment for ARXPS, and Future Developments in ARXPS'. There were 33 participants at the workshop. © 2009 John Wiley & Sons, Ltd.
Author(s): Herrera-Gomez A, Grant J, Cumpson P, Jenko M, Aguirre-Tostado F, Brundle C, Conard T, Conti G, Fadley C, Fulghum J, Kobayashi K, K̈ov́er L, Nohira H, Opila R, Oswald S, Paynter R, Wallace R, Werner W, Wolstenholme J
Publication type: Article
Publication status: Published
Journal: Surface and Interface Analysis
Year: 2009
Volume: 41
Issue: 11
Pages: 840-857
ISSN (print): 0142-2421
ISSN (electronic): 1096-9918
Publisher: John Wiley & Sons Ltd.
URL: http://dx.doi.org/10.1002/sia.3105
DOI: 10.1002/sia.3105
Altmetrics provided by Altmetric
