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Temperature dependent electrical properties of plasma grown gate oxides on tensile strained Si0.993C0.007 layers

Lookup NU author(s): Dr Rajat Mahapatra

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Author(s): Mahapatra R, Kar GS, Maikap S, Ray SK

Publication type: Article

Publication status: Published

Journal: Journal of Materials Science: Materials in Electronics

Year: 2004

Volume: 15

Issue: 1

Pages: 43-46

ISSN (print): 0957-4522

ISSN (electronic): 1573-482X

Publisher: Springer New York LLC

URL: http://dx.doi.org/10.1023/A:1026245021545

DOI: 10.1023/A:1026245021545

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