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The Newcastle University research output collection, currently available on ePrints, will shortly be moving to a new open repository platform, Figshare. To prepare for the data migration we have paused adding new content to ePrints, and will resume once the new repository is launched. During this time you will continue to have access to ePrints (but no new content will appear). We will share updates here when available.

Temperature dependent electrical properties of plasma grown gate oxides on tensile strained Si0.993C0.007 layers

Lookup NU author(s): Dr Rajat Mahapatra

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Publication metadata

Author(s): Mahapatra R, Kar GS, Maikap S, Ray SK

Publication type: Article

Publication status: Published

Journal: Journal of Materials Science: Materials in Electronics

Year: 2004

Volume: 15

Issue: 1

Pages: 43-46

ISSN (print): 0957-4522

ISSN (electronic): 1573-482X

Publisher: Springer New York LLC

URL: http://dx.doi.org/10.1023/A:1026245021545

DOI: 10.1023/A:1026245021545


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