ePrints

M-PRES: a statistical tool for modelling the impact of manufacturing process variations on circuit-level performance parameters

Lookup NU author(s): Santosh Shedabale, Dr Gordon Russell, Professor Alex Yakovlev

Downloads

Full text for this publication is not currently held within this repository. Alternative links are provided below where available.

Abstract

The effects of process variations on the performance of nanometre CMOS circuits have become a serious design issue, aggravated by further scaling of device dimensions. This article presents a statistical TCAD tool called Multilevel-Partitioned REsponse Surface Modelling (M-PRES) to model the impact of manufacturing process variations on circuit performance; an SRAM cell is used as a demonstration vehicle for the tool. A new non-Gaussian approach for modelling variations for sub-90 nm technologies is also presented. A comparison is made with the Monte Carlo approach, demonstrating four times (4x) computationally efficiency for M-PRES without the loss of accuracy. The M-PRES models are also re-usable reducing the computation time for the analysis of other sets of process data down to a few tens of seconds.

Publication metadata

Author(s): Shedabale S; Russell G; Yakovlev A

Publication type: Article

Publication status: Published

Journal: IET Circuits, Devices and Systems Series

Year: 2011

Volume: 5

Issue: 5

Pages: 403-410

Print publication date: 01/09/2011

ISSN (print): 1751-858X

ISSN (electronic): 1751-8598

Publisher: The Institution of Engineering and Technology

URL: http://dx.doi.org/10.1049/iet-cds.2010.0110

DOI: 10.1049/iet-cds.2010.0110

Altmetrics

Share