ePrints

Material dependence of argon cluster ion sputter yield in polymers: Method and measurements of relative sputter yields for 19 polymers

Lookup NU author(s): Professor Peter Cumpson, Dr Jose Portoles, Dr Naoko Sano

Downloads

• Published version [.pdf]

Abstract

There is a pressing need for reference data to allow sputter depth-profiling of polymers using cluster and polyatomic ion sources for the quantification of depth in XPS and SIMS. The authors have developed a new method of sputter rate measurement based on a combination of contact masking and white-light interferometry. This allowed us to measure sputter rates for 19 different polymers of technological significance, a much wider set of data than any available previously. The results show a much larger range of sputter yield than might previously have been expected. For example, the sputter yield of PMMA being more than ten times that of poly ether ether ketone when using argon ion clusters of around 4 eV/atom, with other polymers being widely distributed between these extremes. Without reference data for sputter rate this wide range could lead to major errors in depth estimation in sputter depth-profiling of polymer coatings, biomaterials, nanostructures, polymer electronic and polymer photovoltaic devices.

Publication metadata

Author(s): Cumpson PJ, Portoles JF, Sano N

Publication type: Article

Publication status: Published

Journal: Journal of Vacuum Science & Technology A

Year: 2013

Volume: 31

Issue: 2

Print publication date: 11/02/2013

Date deposited: 20/09/2013

ISSN (print): 0734-2101

Publisher: AVS: Science & Technology of Materials, Interfaces and Processing

URL: http://dx.doi.org/10.1116/1.4791669

DOI: 10.1116/1.4791669

Notes: This paper was presented at the 59th Symposium of the American Vacuum Society, Tampa, FL, October 29, 2012

Altmetrics

Share