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Interfacial reactions of Ni on Si1-xGex (x=0.2, 0.3) at low temperature by rapid thermal annealing

Lookup NU author(s): Dr Sanatan Chattopadhyay

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Author(s): Chattopadhyay S; Zhao HB; Pey KL; Choi WK; Fitzgerald EA; Antoniadis DA; Lee PS

Publication type: Article

Publication status: Published

Journal: Journal of Applied Physics

Year: 2002

Volume: 92

Issue: 1

Pages: 214-217

ISSN (print): 0021-8979

ISSN (electronic): 1089-7550

Publisher: American Institute of Physics

URL: http://dx.doi.org/10.1063/1.1482423

DOI: 10.1063/1.1482423

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