Patrycja Stachelek Dr Sanatan Chattopadhyay Emeritus Professor Anthony Harriman
| Solvent-Driven Conformational Exchange for Amide-Linked Bichromophoric BODIPY Derivatives | 2016 |
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Andrew Bryant Dr Ahmed Elattar Dr Sanatan Chattopadhyay
| Surgical cytoreduction for recurrent epithelial ovarian cancer | 2013 |
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Dr Patrick Yu Wai Man Dr Sanatan Chattopadhyay Philip Griffiths Professor Patrick Chinnery
| A randomized placebo-controlled trial of idebenone in Leber's hereditary optic neuropathy | 2011 |
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Santosh Shedabale Dr Gordon Russell Professor Alex Yakovlev Dr Sanatan Chattopadhyay
| Statistical modelling of the variation in advanced process technologies using a multi-level partitioned response surface approach | 2008 |
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Dr Rajat Mahapatra Dr Alton Horsfall Dr Sanatan Chattopadhyay Professor Nick Wright
| Effects of interface engineering for HfO2 gate dielectric stack on 4H-SiC | 2007 |
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Dr Rajat Mahapatra Peter Tappin Bing Miao Dr Alton Horsfall Dr Sanatan Chattopadhyay et al. | Impact of interfacial nitridation of HfO2 high-k gate dielectric stack on 4H-SiC | 2007 |
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Dr Sanatan Chattopadhyay Professor Alex Yakovlev
| Impact of strain on the design of low-power high-speed circuits | 2007 |
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Dr Sanatan Chattopadhyay Professor Alex Yakovlev
| Impact of strain on the design of low-power high-speed circuits | 2007 |
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Dr Rajat Mahapatra Nipapan Poolamai Dr Alton Horsfall Dr Sanatan Chattopadhyay Professor Nick Wright et al. | Leakage current and charge trapping behavior in Ti O2 Si O2 high- κ gate dielectric stack on 4H-SiC substrate | 2007 |
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Dr Yuk Tsang Dr Sanatan Chattopadhyay Dr Suresh Uppal Dr Enrique Escobedo-Cousin Deepak Ramakrishnan et al. | Modeling of the threshold voltage in strained Si/Si1-x Gex/S1-yGey(x ≥ y) CMOS architectures | 2007 |
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Dr Yuk Tsang Dr Sanatan Chattopadhyay Dr Kelvin Kwa Goutan Dalapati Rouzet Agaiby et al. | Analytical model for threshold voltage of p-MOSFET in strained-Si/SiGe dual channel architecture | 2006 |
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Dr Sanatan Chattopadhyay John Varzgar Dr Johan Seger Dr Yuk Tsang Dr Kelvin Kwa et al. | Capacitance-voltage (C-V) technique for the characterisation of stained Si/Si1-xGex hetero-structure MOS devices | 2006 |
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Dr Sanatan Chattopadhyay John Varzgar Dr Johan Seger Dr Yuk Tsang Dr Kelvin Kwa et al. | Capacitance-voltage (C-V) technique for the characterisation of strained Si/Si1-xGex hetero-structure MOS devices | 2006 |
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Dr Rajat Mahapatra Nipapan Poolamai Dr Sanatan Chattopadhyay Professor Nick Wright
| Characterization of thermally oxidized Ti/SiO2 gate dielectric stacks on 4H-SiC substrate | 2006 |
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Dr Sarah Olsen Dr Enrique Escobedo-Cousin John Varzgar Rimoon Agaiby Dr Johan Seger et al. | Control of self-heating in thin virtual substrate strained Si MOSFETs | 2006 |
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Arup Saha Dr Sanatan Chattopadhyay
| Determination of the interface properties of Ni-silicided strained-Si/SiGe heterostructure Schottky diodes using capacitance-voltage technique | 2006 |
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Arup Saha Dr Sanatan Chattopadhyay
| Effect of silicidation on the electrical characteristics of polycrystalline-SiGe Schottky diode | 2006 |
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Goutan Dalapati Dr Sanatan Chattopadhyay Luke Driscoll Professor Anthony O'Neill Dr Kelvin Kwa et al. | Extraction and modelling of strained-Si MOSFET parameters using small signal channel conductance method | 2006 |
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Goutan Dalapati Dr Sanatan Chattopadhyay Luke Driscoll Professor Anthony O'Neill Dr Kelvin Kwa et al. | Extraction of strained-Si metal-oxide-semiconductor field-effect transistor parameters using small signal channel conductance method | 2006 |
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John Varzgar Dr Mehdi Kanoun Dr Suresh Uppal Dr Sanatan Chattopadhyay Dr Sarah Olsen et al. | Gate Oxide Reliability of Strained Si NMOS Devices Employing a Thin SiFe Strain Relaxed Buffer | 2006 |
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John Varzgar Dr Sanatan Chattopadhyay Dr Suresh Uppal Dr Sarah Olsen Professor Anthony O'Neill et al. | Gate oxide reliability of strained Si NMOS devices employing a thin SiGe strain-relaxed buffer | 2006 |
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Dr Suresh Uppal John Varzgar Dr Sanatan Chattopadhyay Dr Sarah Olsen Professor Anthony O'Neill et al. | Gate oxide reliability of strained Si/SiGe MOS: effect of Ge content variation | 2006 |
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Dr Suresh Uppal John Varzgar Dr Mehdi Kanoun Dr Sanatan Chattopadhyay Dr Sarah Olsen et al. | Gate Oxide Reliability on strained Si/SiGe MOS: Effect of Ge content variation | 2006 |
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Dr Suresh Uppal Dr Mehdi Kanoun Dr Sanatan Chattopadhyay Rimoon Agaiby Dr Sarah Olsen et al. | Ge out-diffusion and its effect on electrical properties in s-Si/SiGe devices | 2006 |
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Dr Suresh Uppal Dr Mehdi Kanoun Dr Sanatan Chattopadhyay Rouzet Agaiby Dr Sarah Olsen et al. | Ge out-diffusion and its effect on electrical properties in s-Si/SiGe devices | 2006 |
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Dr Ming-Hung Weng Dr Rajat Mahapatra Peter Tappin Bing Miao Dr Sanatan Chattopadhyay et al. | High temperature characterization of high-κ dielectrics on SiC | 2006 |
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Dr Suresh Uppal Dr Mehdi Kanoun John Varzgar Dr Sanatan Chattopadhyay Dr Sarah Olsen et al. | Impact of Ge content on the gate oxide reliability of strained-Si/SiGe MOS devices | 2006 |
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Dr Suresh Uppal Dr Mehdi Kanoun John Varzgar Dr Sanatan Chattopadhyay Dr Sarah Olsen et al. | Impact of Ge content on the gate oxide reliability of strained-Si/SiGe MOS devices | 2006 |
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Goutan Dalapati Dr Kelvin Kwa Dr Sarah Olsen Dr Sanatan Chattopadhyay Professor Anthony O'Neill et al. | Impact of strained Si thickness and Ge our diffusion on strained-Si/SiO2 interface quality for surface channel strained Si n-MOSFET devices | 2006 |
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Goutan Dalapati Dr Sanatan Chattopadhyay Dr Kelvin Kwa Dr Sarah Olsen Dr Yuk Tsang et al. | Impact of strained-Si thickness and Ge out-diffusion on gate oxide quality for strained-Si surface channel n-MOSFETs | 2006 |
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Arup Saha Dr Alton Horsfall Dr Sanatan Chattopadhyay Professor Nick Wright Professor Anthony O'Neill et al. | Quantum-mechanical modeling of current-voltage characteristics of Ti-silicided Schottky diodes | 2006 |
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Goutan Dalapati Dr Sanatan Chattopadhyay Dr Yuriy Butenko Professor Lidija Siller
| Rapid thermal oxidation of Ge-rich Si1-xGex heterolayers | 2006 |
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John Varzgar Dr Mehdi Kanoun Dr Suresh Uppal Dr Sanatan Chattopadhyay Dr Yuk Tsang et al. | Reliability study of ultra-thin gate oxides on strained-Si/SiGe MOS structures | 2006 |
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John Varzgar Dr Mehdi Kanoun Dr Suresh Uppal Dr Sanatan Chattopadhyay Dr Yuk Tsang et al. | Reliability study of ultra-thin gate oxides on strained-Si/SiGe MOS structures | 2006 |
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Professor Anthony O'Neill Dr Sarah Olsen Dr Enrique Escobedo-Cousin John Varzgar Rimoon Agaiby et al. | Strained Si MOSFETs using thin virtual substrates | 2006 |
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Professor Anthony O'Neill Dr Sarah Olsen Dr Enrique Escobedo-Cousin John Varzgar Rimoon Agaiby et al. | Strained Si technology | 2006 |
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Professor Anthony O'Neill Dr Sarah Olsen Dr Sanatan Chattopadhyay
| Strained Si/SiGe MOS technology | 2006 |
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Professor Anthony O'Neill Dr Sarah Olsen Dr Enrique Escobedo-Cousin John Varzgar Rouzet Agaiby et al. | Strained silicon technology | 2006 |
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Dr Sanatan Chattopadhyay
| Surface roughness and interface engineering for gate dielectrics on strained layers | 2006 |
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Goutan Dalapati Dr Kelvin Kwa Dr Sarah Olsen Dr Sanatan Chattopadhyay Professor Anthony O'Neill et al. | Thermal oxidation of strained-Si: impact of strained-Si thickness and Ge on Si/SiO2 interface | 2006 |
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Arup Saha Dr Sanatan Chattopadhyay Goutan Dalapati
| An investigation of electrical and structural properties of Ni-germanosilicided Schottky diode | 2005 |
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Arup Saha Dr Alton Horsfall Dr Sanatan Chattopadhyay
| Barrier In-homogeneities and Carrier Transport in Silicided Schottky Diodes | 2005 |
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Arup Saha Dr Sanatan Chattopadhyay
| Characterization of Metal-Semiconductor Heterointerface using Capacitance-Voltage Technique | 2005 |
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Dr Sanatan Chattopadhyay Professor Alex Yakovlev Emeritus Professor Satnam Dlay Professor Anthony O'Neill
| Design ofsrained silicon inverters for fture VLSI applications | 2005 |
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Dr Sarah Olsen Professor Anthony O'Neill Dr Sanatan Chattopadhyay Dr Kelvin Kwa Luke Driscoll et al. | Doubling speed using strained Si/SiGe CMOS technology | 2005 |
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Arup Saha Dr Sanatan Chattopadhyay Goutan Dalapati
| Effect of annealing on interface state density of Ni-silicided/Si 1-xGex Schottky diode | 2005 |
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Arup Saha Dr Sanatan Chattopadhyay
| Electrical Characterization of Ni-SiGe and Ni(Pt)-SiGe Schottky Diodes | 2005 |
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Dr Kelvin Kwa Dr Sarah Olsen Professor Anthony O'Neill Dr Sanatan Chattopadhyay Goutan Dalapati et al. | Fowler-Nordheim tunnelling in strained Si/SiGe MOS devices: impact of cross-hatching and nanoscale roughness | 2005 |
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Dr Sarah Olsen Luke Driscoll Dr Kelvin Kwa Dr Sanatan Chattopadhyay Professor Anthony O'Neill et al. | High performance strained Si.SiGe n-channel MOSFETs: impact of alloy composition and layer architecture | 2005 |
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Rudra Dhar Goutan Dalapati Dr Sanatan Chattopadhyay Dr Kelvin Kwa Dr Sarah Olsen et al. | Modelling of self-heating in strained Si n-channel MOSFETs on SiGe virtual substrates | 2005 |
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Dr Sanatan Chattopadhyay Arup Saha
| Poly-SiGe Schottky | 2005 |
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Arup Saha Dr Alton Horsfall Dr Sanatan Chattopadhyay Professor Nick Wright Professor Anthony O'Neill et al. | Prediction of barrier inhomogeneities and carrier transport in Ni-silicided Schottky diode | 2005 |
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Dr Sarah Olsen Dr Sanatan Chattopadhyay Professor Anthony O'Neill Dr Kelvin Kwa Dr Jie Zhang et al. | Strained Si/SiGe CMOS: high performance without re-tooling | 2005 |
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Dr Sarah Olsen Professor Anthony O'Neill Dr Piotr Dobrosz Professor Steve Bull Luke Driscoll et al. | Study of strain relaxation in Si/SiGe metal-oxide-semiconductor field-effect transistors | 2005 |
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Arup Saha Dr Sanatan Chattopadhyay
| Technology CAD of silicided Schottky barrier MOSFET for elevated source-drain engineering | 2005 |
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Arup Saha Dr Sanatan Chattopadhyay
| Technology CAD of Silicided Schottky Barrier MOSFETs for Elevated Source Drain Engineering | 2005 |
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Arup Saha Dr Sanatan Chattopadhyay
| Contact metallization on strained-Si | 2004 |
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Dr Sarah Olsen Dr Kelvin Kwa Luke Driscoll Dr Sanatan Chattopadhyay Professor Anthony O'Neill et al. | Design, fabrication and characterisation of strained Si/SiGe MOS transistors | 2004 |
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Arup Saha Dr Sanatan Chattopadhyay
| Effect of annealing on interface state density of Ni-silicided Si1-xGex Schottky diodes | 2004 |
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Arup Saha Dr Sanatan Chattopadhyay
| Effect of Annealing on Interface State Density of Ni-silicided Si1-xGex Schottky Diodes | 2004 |
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Arup Saha Dr Sanatan Chattopadhyay Goutan Dalapati
| Electrical characterization of Niy(Si1-xGe x)1-y/Si1-xGex and NiSi/Si Schottky diodes | 2004 |
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Arup Saha Dr Sanatan Chattopadhyay
| Electrical characterization of TiSi/Si1-x-yGexCy Schottky diodes | 2004 |
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Arup Saha Dr Sanatan Chattopadhyay
| Electrical Characterization of TiSi/Si1-x-yGexCy Schottky Diodes | 2004 |
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Dr Sanatan Chattopadhyay
| Electrical Characterization of TiSi/Si1-x-yGexCy Schottky Diodes | 2004 |
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Dr Sanatan Chattopadhyay Goutan Dalapati Arup Saha
| Electrical Properties of NiSi/strained-Si Schottky diodes | 2004 |
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Dr Sarah Olsen Professor Anthony O'Neill Dr Sanatan Chattopadhyay Dr Kelvin Kwa Luke Driscoll et al. | Evaluation of strained Si/SiGe material for high performance CMOS | 2004 |
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Dr Sarah Olsen Professor Anthony O'Neill Dr Sanatan Chattopadhyay Dr Kelvin Kwa Luke Driscoll et al. | Evaluation of strained Si/SiGe material for high performance CMOS | 2004 |
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Lynn Driscoll Dr Sarah Olsen Dr Sanatan Chattopadhyay Professor Anthony O'Neill Dr Kelvin Kwa et al. | Impact of Ge diffusion and wafer cross hatching on strained Si MOSFET electrical parameters | 2004 |
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Luke Driscoll Dr Sarah Olsen Dr Sanatan Chattopadhyay Professor Anthony O'Neill Dr Kelvin Kwa et al. | Impact of Ge diffusion and wafer cross hatching on strained Si MOSFET electrical parameters | 2004 |
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Luke Driscoll Dr Sarah Olsen Dr Sanatan Chattopadhyay Professor Anthony O'Neill Dr Kelvin Kwa et al. | Impact of Ge diffusion and wafer cross hatching on strained Si MOSFET electrical parameters | 2004 |
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Luke Driscoll Dr Sarah Olsen Dr Sanatan Chattopadhyay Professor Anthony O'Neill Dr Kelvin Kwa et al. | Impact of Ge diffusion and wafer cross hatching on strained Si MOSFET electrical parameters | 2004 |
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Dr Sanatan Chattopadhyay
| On the stability and composition of Ni-silicided Si1-xGex films | 2004 |
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Dr Sarah Olsen Professor Anthony O'Neill Luke Driscoll Dr Sanatan Chattopadhyay Dr Kelvin Kwa et al. | Optimization of alloy composition for high-performance strained-Si-SiGe N-channel MOSFETs | 2004 |
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Dr Sanatan Chattopadhyay
| Stability and composition of Ni-germanosilicided Si/sub 1-x/Ge/sub x/ films | 2004 |
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Dr Sanatan Chattopadhyay Dr Kelvin Kwa Dr Sarah Olsen Professor Anthony O'Neill
| Strained Si MOSFETs on relaxed SiGe platforms: Performance and challenges | 2004 |
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Dr Sarah Olsen Dr Kelvin Kwa Dr Sanatan Chattopadhyay Luke Driscoll Professor Anthony O'Neill et al. | Strained Si/SiGe n-channel MISFETs | 2004 |
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Dr Sarah Olsen Professor Anthony O'Neill Dr Sanatan Chattopadhyay Luke Driscoll Dr Kelvin Kwa et al. | Study of single- and dual-channel designs for high-performance strained-Si-SiGe n-MOSFETs | 2004 |
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Dr Sarah Olsen Professor Anthony O'Neill Professor Steve Bull Dr Sanatan Chattopadhyay Dr Kelvin Kwa et al. | Thermal oxidation of strained Si/SiGe: impact of surface morphology and effect on MOS devices | 2004 |
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Dr Kelvin Kwa Dr Sanatan Chattopadhyay Dr Nebojsa Jankovic Professor Dr Sarah Olsen Luke Driscoll et al. | A model for capacitance reconstruction from measured lossy MOS capacitance-voltage characteristics | 2003 |
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Dr Sanatan Chattopadhyay Dr Kelvin Kwa Dr Sarah Olsen Luke Driscoll Professor Anthony O'Neill et al. | Capacitance - Voltage Characterization of Strained Si/SiGe Multiple Heterojunction Capacitors as a Tool for Heterojunction Metal Oxide Semiconductor Field Effect Transistor Channel Design | 2003 |
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Dr Sanatan Chattopadhyay Dr Kelvin Kwa Dr Sarah Olsen Luke Driscoll Professor Anthony O'Neill et al. | C-V characterization of strained Si/SiGe multiple heterojunction capacitors as a tool for heterojunction MOSFET channel design | 2003 |
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Dr Sarah Olsen Luke Driscoll Dr Kelvin Kwa Dr Sanatan Chattopadhyay Professor Anthony O'Neill et al. | High performance strained Si.SiGe NMOSFETs using a novel CMOS architecture | 2003 |
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Dr Sarah Olsen Luke Driscoll Dr Kelvin Kwa Dr Sanatan Chattopadhyay Professor Anthony O'Neill et al. | High performance strained Si/SiGe n-channel MOSFETs: impact of alloy composition and layer architecture | 2003 |
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Dr Sarah Olsen Luke Driscoll Dr Kelvin Kwa Dr Sanatan Chattopadhyay Professor Anthony O'Neill et al. | High performance strained Si/SiGe nMOSFETs using a novel CMOS architecture | 2003 |
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Dr Sarah Olsen Professor Anthony O'Neill Luke Driscoll Dr Kelvin Kwa Dr Sanatan Chattopadhyay et al. | High-performance nMOSFETs using a novel strained Si/SiGe CMOS architecture | 2003 |
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Dr Sarah Olsen Professor Anthony O'Neill Dr Sanatan Chattopadhyay Dr Kelvin Kwa Luke Driscoll et al. | Impact of virtual substrate Ge composition on strained Si MOSFET performance | 2003 |
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Professor Anthony O'Neill Dr Sanatan Chattopadhyay Dr Kelvin Kwa Luke Driscoll Professor Steve Bull et al. | Impact of Virtual Substrate Ge Composition on Strained Si MOSFET Performance | 2003 |
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Dr Sarah Olsen Professor Anthony O'Neill Dr Sanatan Chattopadhyay Dr Kelvin Kwa Luke Driscoll et al. | Impact of virtual substrate growth on high performance strained Si/SiGe double quantum well metal-oxide-semiconductor field-effect transistors | 2003 |
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Dr Sarah Olsen Professor Anthony O'Neill Dr Sanatan Chattopadhyay Luke Driscoll Dr Kelvin Kwa et al. | N-MOSFET performance in single and dual channel strained Si/SiGe CMOS architectures | 2003 |
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Dr Kelvin Kwa Dr Sanatan Chattopadhyay Dr Sarah Olsen Luke Driscoll Professor Anthony O'Neill et al. | Optimisation of channel thickness in strained Si/SiGe MOSFETs | 2003 |
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Dr Kelvin Kwa Dr Sanatan Chattopadhyay Dr Sarah Olsen Luke Driscoll Professor Anthony O'Neill et al. | Optimisation of Channel Thickness in Strained Si/SiGe MOSFETs | 2003 |
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Dr Kelvin Kwa Dr Sanatan Chattopadhyay Dr Sarah Olsen Luke Driscoll Professor Anthony O'Neill et al. | Optimisation of channel thickness in strained Si/SiGe MOSFETs | 2003 |
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Dr Sanatan Chattopadhyay
| Interfacial reactions of Ni on Si1-xGex (x=0.2, 0.3) at low temperature by rapid thermal annealing | 2002 |
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Dr Sanatan Chattopadhyay
| Thermal reaction of nickel and Si/sub 0.75/Ge/sub 0.25/ alloy | 2002 |
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Dr Sanatan Chattopadhyay
| Thermal reaction of nickel and Si0.75 Ge0.25 alloy | 2002 |
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