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Ultrathin HfO2 gate dielectrics on partially strain compensated SiGeC/Si heterostructure

Lookup NU author(s): Dr Rajat Mahapatra

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Publication metadata

Author(s): Ray SK, Mahapatra R, Maikap S, Dhar A, Bhattacharya D, Lee JH

Publication type: Article

Publication status: Published

Journal: Materials Science in Semiconductor Processing

Year: 2004

Volume: 7

Issue: 4-6

Pages: 203-208

Print publication date: 01/01/2004

ISSN (print): 1369-8001

ISSN (electronic): 1873-4081

Publisher: Pergamon

URL: http://dx.doi.org/10.1016/j.mssp.2004.09.015

DOI: 10.1016/j.mssp.2004.09.015

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