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Effect of heating ramp rates on transient enhanced diffusion in ion-implanted silicon

Lookup NU author(s): Professor Nick Cowern

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Author(s): Cowern NEB; Mannino G; Stolk PA; de Boer WB; Dirks AG; Roozeboom F; van Berkum JGM; Woerlee PH; Toan NN

Publication type: Article

Publication status: Published

Journal: Applied Physics Letters

Year: 2001

Volume: 78

Issue: 7

Pages: 889-891

ISSN (print): 0003-6951

ISSN (electronic): 1077-3118

Publisher: American Institute of Physics

URL: http://dx.doi.org/10.1063/1.1347397

DOI: 10.1063/1.1347397

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