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Electrical and interfacial characteristics of ultrathin ZrO2 gate dielectrics on strain compensated SiGeC/Si heterostructure

Lookup NU author(s): Dr Rajat Mahapatra

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Author(s): Mahapatra R; Lee JH; Maikap S; Kar GS; Dhar A; Hwang NM; Kim DY; Mathur BK; Ray SK

Publication type: Article

Publication status: Published

Journal: Applied Physics Letters

Year: 2003

Volume: 82

Issue: 14

Pages: 2320

ISSN (print): 0003-6951

ISSN (electronic): 1077-3118

Publisher: American Institute of Physics

URL: http://dx.doi.org/10.1063/1.1566480

DOI: 10.1063/1.1566480

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