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Boride-enhanced diffusion in silicon: Bulk and surface layers

Lookup NU author(s): Professor Nick Cowern

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Author(s): Cowern NEB; Theunissen MJJ; Roozeboom F; van Berkum JGM

Publication type: Article

Publication status: Published

Journal: Applied Physics Letters

Year: 1999

Volume: 75

Issue: 2

Pages: 181-183

ISSN (print): 0003-6951

ISSN (electronic): 1077-3118

Publisher: American Institute of Physics

URL: http://dx.doi.org/10.1063/1.124312

DOI: 10.1063/1.124312

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