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Role of self- and boron-interstitial clusters in transient enhanced diffusion in silicon

Lookup NU author(s): Professor Nick Cowern

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Author(s): Mannino G, Cowern NEB, Roozeboom F, van Berkum JGM

Publication type: Article

Publication status: Published

Journal: Applied Physics Letters

Year: 2000

Volume: 76

Issue: 7

Pages: 855-858

ISSN (print): 0003-6951

ISSN (electronic): 1520-8842

Publisher: American Institute of Physics

URL: http://dx.doi.org/10.1063/1.125607

DOI: 10.1063/1.125607

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