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Effect of fluorine on the activation and diffusion behavior of boron implanted preamorphized silicon

Lookup NU author(s): Professor Nick Cowern

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Author(s): Paul S, Lerch W, Colombeau B, Cowern NEB, Cristiano F, Boninelli S, Bolze D

Publication type: Article

Publication status: Published

Journal: Journal of Vacuum Science and Technology B

Year: 2006

Volume: 24

Issue: 1

Pages: 437-441

ISSN (print): 1071-1023

ISSN (electronic): 1520-8567

Publisher: American Institute of Physics

URL: http://dx.doi.org/10.1116/1.2127935

DOI: 10.1116/1.2127935

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