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Slow positron annihilation studies of defects in metal implanted TiN coatings

Lookup NU author(s): Professor Steve BullORCiD


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Positron annihilation spectroscopy has been used to investigate the effects of metal ion implantation on the defect density of TiN coatings deposited onto cemented carbide substrates by chemical vapour deposition (CVD). With a range of ions, accelerated up to 70 kV, at doses up to 2.8 × 1017 ions/cm2, it was found that defect levels increase with dose, ion energy and ion mass and correlate with the momentum transfer from the ion beam. For higher ion masses, sputtering removes damaged material. Anomalously high defect levels are produced by yttrium ion implantation.

Publication metadata

Author(s): Bull SJ, Rice-Evans PC, Saleh A, Perry AJ, Treglio JR

Publication type: Article

Publication status: Published

Journal: Surface and Coatings Technology

Year: 1997

Volume: 91

Issue: 1-2

Pages: 7-12

Print publication date: 01/05/1997

ISSN (print): 0257-8972

ISSN (electronic):

Publisher: Elsevier


DOI: 10.1016/S0257-8972(96)03122-2


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