Toggle Main Menu Toggle Search

Open Access padlockePrints

Hardness measurements on thin IBAD CNx films - A comparative study

Lookup NU author(s): Thomas Malkow, Professor Steve BullORCiD


Full text for this publication is not currently held within this repository. Alternative links are provided below where available.


The hardness of carbon nitride (CNx) films deposited on Si(111) substrates using ion beam assisted deposition (IBAD) with varying deposition parameters was estimated using nanoindentation. For the nanoindentation, the TriboScope®, an atomic force microscope (AFM) add-on, was used, which allowed not only very small applied loads (〈25 μN), but also the scanning of the residual indenter impression immediately after the indenter withdrawal. The hardness of the films obtained by the unloading analysis was compared with the hardness estimated using the plastic area measured by the AFM. As the applied load decreases, both hardness measurements show an opposite trend; the load-on hardness decreases whereas the universal load-off hardness increases. Undoubtedly, this is attributable to the different hardness definitions (load-on/off) and further associated with the unusually high elastic recovery of this material. Surprisingly, this elastic recovery occurs not only in the depth and the shape but also in the area of the residual indenter impression. This extreme elastic recovery is a particular feature of indentations in CNx films. © 2001 Elsevier Science B.V. All rights reserved.

Publication metadata

Author(s): Malkow T, Bull SJ

Publication type: Article

Publication status: Published

Journal: Surface and Coatings Technology

Year: 2001

Volume: 137

Issue: 2-3

Pages: 197-204

Print publication date: 15/03/2001

ISSN (print): 0257-8972

ISSN (electronic):

Publisher: Elsevier


DOI: 10.1016/S0257-8972(00)01101-4


Altmetrics provided by Altmetric