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The role of preamorphization and activation for ultra shallow junction formation on strained Si layers grown on SiGe buffer

Lookup NU author(s): Professor Nick Cowern

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Author(s): Pawlak BJ, Vandervorst W, Lindsay R, De Wolf I, Roozeboom F, Delhougne R, Benedetti A, Loo R, Caymax M, Maex K, Cowern NEB

Publication type: Article

Publication status: Published

Journal: Materials Research Society Symposium Proceedings: High-Mobility Group-IV Materials and Devices

Year: 2004

Volume: 809

Pages: 281-286

ISSN (print): 0272-9172

ISSN (electronic): 1946-4274

Publisher: Materials Research Society

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