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On the modeling of transient diffusion and activation of boron during post-implantation annealing

Lookup NU author(s): Professor Nick Cowern


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Publication metadata

Author(s): Pichler P, Ortiz CJ, Colombeau B, Cowern NEB, Lampin E, Claverie A, Cristiano F, Lerch W, Paul S

Publication type: Conference Proceedings (inc. Abstract)

Publication status: Published

Conference Name: International Electron Device Meeting (invited paper)

Year of Conference: 2004

Pages: 967-970

Publisher: IEEE


DOI: 10.1109/IEDM.2004.1419347

Library holdings: Search Newcastle University Library for this item

ISBN: 0780386841