Electrical deactivation and diffusion of boron in preamorphized ultrashallow junctions: interstitial transport and F co-implant control

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Author(s): Colombeau B, Smith AJ, Cowern NEB, Lerch W, Paul S, Pawlak BJ, Cristiano F, Hebras X, Bolze D, Ortiz C, Pichler P

Publication type: Conference Proceedings (inc. Abstract)

Publication status: Published

Conference Name: International Electron Device Meeting - IEDM technical digest

Year of Conference: 2004

Pages: 971-974

Publisher: IEEE

URL: http://dx.doi.org/10.1109/IEDM.2004.1419348

DOI: 10.1109/IEDM.2004.1419348

Library holdings: Search Newcastle University Library for this item

ISBN: 0780386841

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