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The role of preamorphization and activation for ultra shallow junction formation on strained Si layers grown on SiGe buffer

Lookup NU author(s): Professor Nick Cowern

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Author(s): Pawlak BJ, Vandervorst W, Lindsay R, De Wolf I, Roozeboom F, Delhougne R, Benedetti A, Loo R, Caymax M, Maex K, Cowern NEB

Editor(s): Pichler, P., Claverie, A., Lindsay, R., Orlowski, M., Windl, W.

Publication type: Conference Proceedings (inc. Abstract)

Publication status: Published

Conference Name: Silicon Front-End Junction Formation-Physics and Technology

Year of Conference: 2004

Pages: 423-428

ISSN: 0272-9172

Publisher: Materials Research Society

Library holdings: Search Newcastle University Library for this item

Series Title: Materials Research Society Symposium Proceedings

ISBN: 1558997601

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