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Optimization of fluorine co-implantation for PMOS source and drain extension formation for 65nm technology node

Lookup NU author(s): Professor Nick Cowern


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Publication metadata

Author(s): Graoui H, Hilkene M, McComb B, Castle M, Felch S, Cowern NEB, Al-Bayati A, Tjandra A, Foad MA

Editor(s): Pichler, P., Claverie, A., Lindsay, R., Orlowski, M., Windl, W.

Publication type: Conference Proceedings (inc. Abstract)

Publication status: Published

Conference Name: Silicon Front-End Junction Formation-Physics and Technology

Year of Conference: 2004

Pages: 247-252

ISSN: 0272-9172

Publisher: Materials Research Society

Library holdings: Search Newcastle University Library for this item

Series Title: Materials Research Society Symposium Proceedings

ISBN: 1558997601