Browse by author
Lookup NU author(s): Praneet Bhatnagar, Dr Alton Horsfall, Professor Nick Wright, Dr Christopher Johnson, Dr Konstantin VasilevskiyORCiD, Professor Anthony O'Neill
Full text for this publication is not currently held within this repository. Alternative links are provided below where available.
We present the optimization of an enhancement mode vertical channel junction field effect transistor (VJFET), by investigating the variation of the controlled power density (the product of the on-state current density and the forward blocking voltage) of the device on both the source finger width and temperature. It is shown that a reduction in the source finger width is required to maximize this switch VA as the ambient temperature is increased. The structure considered has a varying finger width of 2.1 μm for operation at 300 K, which falls to 1.9 μm at 700 K. This reduction in finger width is related to the reduction in blocking voltage as the temperature is increased due to the reduction in the built in potential of the p-n junction used to form the gate. We show that a device with a finger with of 1.9 μm is optimal across the temperature range studied, due to the maintenance of the forward blocking voltage at approximately 1200 V. The reduction in the controlled power density as the temperature increases is linked to the drop in forward current density of the device. © 2004 Elsevier Ltd. All rights reserved.
Author(s): Bhatnagar P, Horsfall AB, Wright NG, Johnson CM, Vassilevski KV, O'Neill AG
Publication type: Article
Publication status: Published
Journal: Solid-State Electronics
Year: 2005
Volume: 49
Issue: 3
Pages: 453-458
ISSN (print): 0038-1101
ISSN (electronic): 1879-2405
Publisher: Pergamon
URL: http://dx.doi.org/10.1016/j.sse.2004.12.002
DOI: 10.1016/j.sse.2004.12.002
Altmetrics provided by Altmetric