Optimisation of implanted guard-ring terminations in 4H-SiC Schottky diodes

Horsfall, AB; Vassilevski, KV; Johnson, CM; Wright, NG; O'Neill, AG; Gwilliam, RM

doi:10.4028/www.scientific.net/MSF.389-393.1149

Optimisation of implanted guard-ring terminations in 4H-SiC Schottky diodes

Lookup NU author(s): Dr Alton Horsfall, Dr Konstantin Vasilevskiy ORCiD, Dr Christopher Johnson, Professor Nick Wright, Professor Anthony O'Neill

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Abstract

The influence of geometry of boron implanted guard rings on the characteristics of Schottky diodes on 4H-SiC has been investigated. Results suggest, that whilst the breakdown voltage can be increased, the creation of damage from the implantation process and the additional processing requirements serve to increase the leakage current through the device to unacceptable levels. The leakage current through the terminated diodes is found to be proportional to the diode contact area. At high temperatures the leakage current density of the terminated diodes is equal to unterminated devices suggesting a common mechanism.