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Effect of metal-oxide-semiconductor processing on the surface rouhness of strained Si/SiGe material

Lookup NU author(s): Dr Sarah Olsen, Professor Anthony O'Neill, Professor Steve BullORCiD



This is the final published version of an article that has been published in its final definitive form by American Institute of Physics, 2002.

For re-use rights please refer to the publisher's terms and conditions.

Publication metadata

Author(s): Olsen SH, O'Neill AG, Bull SJ, Woods NJ, Zhang J

Publication type: Article

Publication status: Published

Journal: Journal of Applied Physics

Year: 2002

Volume: 92

Issue: 3

Pages: 1298-

Date deposited: 15/09/2016

ISSN (print): 0021-8979

ISSN (electronic): 1520-8850

Publisher: American Institute of Physics


DOI: 10.1063/1.1489712


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