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Lookup NU author(s): Sorin Soare, Professor Steve BullORCiD, Dr Adrian OilaORCiD, Professor Anthony O'Neill, Professor Nick Wright, Dr Alton Horsfall
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Sputtered aluminium layers from 250 to 2000 nm thick on (100) silicon have been indented to various depths and the nanoindentation load-displacement curves recorded. The loading curves were then simulated by finite element analysis and the results compared to identify the yield properties of the coating. Modelling data for thicker samples closely follows experimental data, but for thinner coatings there is a considerable gradient in properties through the film thickness. © Carl Hanser Verlag.
Author(s): Soare S, Bull SJ, Oila A, O'Neill AG, Wright NG, Horsfall A, Dos Santos JMM
Publication type: Article
Publication status: Published
Journal: Zeitschrift für Metallkunde
Year: 2005
Volume: 96
Issue: 11
Pages: 1262-1266
Print publication date: 01/11/2005
ISSN (print): 0044-3093
ISSN (electronic):
Publisher: Carl Hanser Verlag