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Lookup NU author(s): Dr Enrique Escobedo-Cousin,
Dr Sarah Olsen,
Professor Steve Bull,
Professor Anthony O'Neill
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In this work, the impact of high temperature annealing typical of CMOS processing on the surface morphology of thin SiGe SRBs is investigated for strained silicon layers above and below the critical thickness.
Author(s): Escobedo-Cousin E, Olsen SH, Bull SJ, O'Neill AG, Coulson H, Claeys C, Loo R, Delhougne R, Caymax M
Publication type: Conference Proceedings (inc. Abstract)
Publication status: Published
Conference Name: Third International SiGe Technology and Device Meeting, ISTDM 2006 - Conference Digest
Year of Conference: 2006
Publisher: IEEE Press
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