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Strained Si/SiGe MOS technology: improving gate dielectric integrity

Lookup NU author(s): Dr Sarah Olsen, Rouzet Agaiby, Dr Enrique Escobedo-Cousin, Professor Anthony O'Neill

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Publication metadata

Author(s): Olsen SH, Yan L, Agaiby R, Escobedo-Cousin E, O'Neill AG

Publication type: Conference Proceedings (inc. Abstract)

Publication status: Unknown

Conference Name: International Symposium on Advanced Gate Stack Technology (ISAGST)

Year of Conference: 2007

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