Browse by author
Lookup NU author(s): Kazuhiro Adachi, Dr Christopher Johnson, Dr Sylvie Ortolland, Professor Nick Wright, Professor Anthony O'Neill
Full text for this publication is not currently held within this repository. Alternative links are provided below where available.
In this paper, a double implanted vertical npvn 4H-SiC power bipolar transistor (BJT) is studied using TCAD simulation. The choice of physical models employed in the simulations is shown to markedly affect critical device characteristics such as current gain. Incomplete ionisation of accepters in the base region is shown to result in dramatically increased gain at room temperature but a reduced current drive capability, which is caused by emitter current crowding. The effects of band-gap narrowing and lifetime variations are also studied. The simulations demonstrate that a SiC power BJT should indeed be a viable device but that much work needs to be done to improve the accuracy of physical models, and for implanted SiC in particular, before reliable predictions can be made.
Author(s): Adachi K, Johnson CM, Ortolland S, Wright NG, O'Neill AG
Publication type: Article
Publication status: Published
Journal: Materials Science Forum: Silicon Carbide and Related Materials 1999
Year: 1999
Volume: 338-342
Pages: 1419-1422
Print publication date: 01/01/2000
ISSN (print): 0255-5476
ISSN (electronic):
Publisher: Trans Tech Publications
URL: http://dx.doi.org/10.4028/www.scientific.net/MSF.338-342.1419
DOI: 10.4028/www.scientific.net/MSF.338-342.1419
Altmetrics provided by Altmetric
