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Gate oxide reliability of strained Si/SiGe MOS: effect of Ge content variation

Lookup NU author(s): Dr Suresh Uppal, John Varzgar, Dr Sanatan Chattopadhyay, Dr Sarah Olsen, Professor Anthony O'Neill

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Author(s): Uppal S, Varzgar J, Chattopadhyay S, Olsen SH, O'Neill AG

Publication type: Conference Proceedings (inc. Abstract)

Publication status: Published

Conference Name: Proceedings of the European Materials Research Society Conference (E-MRS)

Year of Conference: 2006

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