Toggle Main Menu Toggle Search

Open Access padlockePrints

The relationship between strain generation and relaxation, composition and electrical performance in strained Si/SiGe MOS technology

Lookup NU author(s): Dr Sarah Olsen, Dr Piotr Dobrosz, Professor Steve BullORCiD, Professor Anthony O'Neill


Full text for this publication is not currently held within this repository. Alternative links are provided below where available.

Publication metadata

Author(s): Olsen SH, Dobrosz P, Bull S, O'Neill A

Publication type: Conference Proceedings (inc. Abstract)

Publication status: Published

Conference Name: 33rd International Conference on Metallurgical Coatings and Thin Films (ICMCTF 2006)

Year of Conference: 2006