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Gate Oxide Reliability on strained Si/SiGe MOS: Effect of Ge content variation

Lookup NU author(s): Dr Suresh Uppal, John Varzgar, Dr Mehdi Kanoun, Dr Sanatan Chattopadhyay, Dr Sarah Olsen, Professor Anthony O'Neill


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Publication metadata

Author(s): Uppal S, Varzgar JB, Kanoun M, Chattopadhyay S, Olsen SH, O'Neill AG

Publication type: Conference Proceedings (inc. Abstract)

Publication status: Published

Conference Name: Materials Science and Engineering B: Advanced Functional Solid-state Materials. E-MRS Conference

Year of Conference: 2006

Pages: 207-209

Publisher: Elsevier SA

Library holdings: Search Newcastle University Library for this item

ISBN: 18734944