Toggle Main Menu Toggle Search

Open Access padlockePrints

Optimisation of Channel Thickness in Strained Si/SiGe MOSFETs

Lookup NU author(s): Dr Kelvin Kwa, Dr Sanatan Chattopadhyay, Dr Sarah Olsen, Luke Driscoll, Professor Anthony O'Neill

Downloads

Full text for this publication is not currently held within this repository. Alternative links are provided below where available.


Publication metadata

Author(s): Kwa K, Chattopadhyay S, Olsen S, Driscoll L, O'Neill AG

Publication type: Conference Proceedings (inc. Abstract)

Publication status: Published

Conference Name: Proc ESSDERC

Year of Conference: 2003

Pages: 501-504


Share