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Thermal oxidation of strained-Si: impact of strained-Si thickness and Ge on Si/SiO2 interface

Lookup NU author(s): Goutan Dalapati, Dr Kelvin Kwa, Dr Sarah Olsen, Dr Sanatan Chattopadhyay, Professor Anthony O'Neill, Luke Driscoll, Dr Yuk Tsang, Rimoon Agaiby, Dr Enrique Escobedo-Cousin

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Author(s): Dalapati GK, Kwa KSK, Olsen SH, Chattopadhyay S, O'Neill AG, Driscoll LS, Tsang YL, Agaiby R, Escobedo-Cousin E

Publication type: Conference Proceedings (inc. Abstract)

Publication status: Published

Conference Name: International Conference on Electronic and Photonic Material, Devices and Systems (EPMDS)

Year of Conference: 2006

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