Dr Rajat Mahapatra Nipapan Poolamai Dr Alton Horsfall Dr Sanatan Chattopadhyay Professor Nick Wright et al. | Leakage current and charge trapping behavior in Ti O2 Si O2 high- κ gate dielectric stack on 4H-SiC substrate | 2007 |
|
Nipapan Poolamai Dr Rajat Mahapatra Professor Nick Wright
| Characteristics of thermally oxidized-Ti as a high-k gate dielectric on SiC metal-oxide-semiconductor devices | 2005 |
|
Dr Rajat Mahapatra Nipapan Poolamai Professor Nick Wright
| Characteristics of thermally oxidized-Ti as a high-k gate dielectric on SiC metal-oxide-semiconductor devices | 2005 |
|
Professor Nick Wright Nipapan Poolamai Dr Konstantin Vasilevskiy Dr Alton Horsfall Dr Christopher Johnson et al. | Benefits of high-k dielectrics in 4H-SiC trench MOSFETs | 2004 |
|